| Definition: A method of fabricating sub-micron and nanoscale features by exposing electrically sensitive surfaces to an electron beam.
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The method is similar to photolithography, but uses electrons rather than photons. Since the wavelength of an electron is far smaller than that of a photon, diffraction is not a limit to the resolution. While EBL is more expensive and less parallel than photolithography, its resolution is higher and it is frequently used to create photolithographic masks.
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