A method of fabricating sub-micron and nanoscale features by exposing electrically sensitive surfaces to an electron beam. The method is similar to photolithography, but uses electrons rather than photons. Since the wavelength of an electron is far smaller than that of a photon, diffraction is not a limit to the resolution. While EBL is more expensive and less parallel than photolithography, its resolution is higher and it is frequently used to create photolithographic masks.